Nanoimprint Lithography

 Nanoimprint Lithography (NIL) is a high-resolution, cost-effective nanofabrication technique used to create nanoscale patterns and structures. This method involves the use of a mold to physically press patterns into a substrate coated with a resist material. The process can replicate intricate details with feature sizes down to a few nanometers, making it ideal for applications in electronics, photonics, biotechnology, and more. NIL offers advantages such as high throughput, low cost, and the ability to pattern over large areas, making it a key technology in the advancement of nanotechnology and microelectronics.

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